2017-05-22 - SEMI

Si wafer shipments reach record high in 1Q 2017

Silicon wafer shipments increased by 3.4% during 1Q 2017 over 4Q 2016 reaching their highest recorded quarterly level and defying…

2017-05-02 - EE Times Asia

GaN transistors boost PV inverter efficiency

650V GaN transistors deliver performance five times better than silicon or silicon carbide products.

2017-04-11 - IBM Research

Quantum transport goes ballistic for future computers

The technique fires electrons through nanowire without being scattered until they hit the opposed electrode, IBM researchers say.

2017-03-16 - Oak Ridge National Laboratory

Etching enables mass production of 2D conductor

Layers of MXenes can be combined to engineer ultrathin electronics, sensors, batteries, supercapacitors and catalysts, researchers say.

2017-03-14 - University of Minnesota College of Science and Engineering

Light pulse flips magnetic memory cell at record speed

Magnetic tunnel junction is critical to advances beyond Moore’s law, but there is a limitation on how fast the material's…

2017-03-14 - University of Minnesota College of Science and Engineering

Setting new record speed for magnetic tunnel junction

The recent advancement establishes a new means of communication between fibre optics and magnetic devices, according to researchers.

2017-03-09 - Webredactie Communication

On-chip laser paves way for scalable quantum computer

The new type of laser is made entirely from superconductors, making it very energy efficient and more stable than previous…

2017-03-08 - Brookhaven National Laboratory

How charge cycles affect sodium battery performance

Charge and discharge cycles degrade sodium-ion batteries' performance, but little was known about their degradation mechanisms. Until now.

2017-03-07 - Georgia Institute of Technology

Thin material shows spectral shift with 15mW power

A modulation of chiroptical responses from metamaterials by manipulating input power paves way for new types of active optics, researchers…

2017-03-06 - Peter Clarke

Resist-based material targets EUV lithography use

The resist is molecular rather than polymeric and brings a number of benefits compared with other chemically accelerated resists.